Direct metallization methods for micro-electronics and advanced manufacturing

May29Wed

Direct metallization methods for micro-electronics and advanced manufacturing

Wed, 29/05/2019 - 14:00 to 15:00

Location:

Speaker: 
Assel Ryspayeva
Affiliation: 
ISSS
Synopsis: 

Micropatterning of conductive traces on non-conductive surfaces such as glass, silicon and flexible plastic substrates enables a multitude of novel micro-electronics applications. New additive techniques are constantly proposed such as 3D printing, metal plating of modified surfaces. This talk will cover newly created manufacturing processes for the metallization of non-conductive surfaces such as silicon, glass, PDMS and thermoplastic polyurethanes. Direct metallization of modified photoresists and surface modification by ion exchange and subsequent plating will be discussed during the seminar. These proposed metallization methods are alternatives to conventional vacuum technology and may open new opportunities in micro-electronics manufacturing.

Biography: 

Assel Ryspayeva received her Beng degree in Electronics majoring in Nanotechnology from Multimedia University, Cyberjaya, Malaysia in 2012 and Joint International MSc degree in Smart System Integration from Heriot-Watt University, University of South-Eastern Norway and Budapest University of Technology and Economics (Master with Distinction). She is currently in her 2nd year of Ph.D. degree in Electrical Engineering at Heriot-Watt University, UK. Her research interest includes nanotechnology, sensors & actuators, BioMEMS, MEMS, advanced microfabrication, additive manufacturing, 3D printing .

Institute: